/PostDoc: Understanding interfacial behaviour of ultra-thin layers for advanced EUV patterning

PostDoc: Understanding interfacial behaviour of ultra-thin layers for advanced EUV patterning

Research & development - Leuven | More than two weeks ago

You will investigate the impact of interfaces and material modification between ultra-thin layers used for future advanced nodes.

Postdoctoral Researcher: understanding interfacial behaviour of ultra-thin layers for advanced EUV patterning

What you will do

The dimension shrink beyond the 3nm-node imposes a reduction in the thickness of many material layers. As layers become thinner, the impact of interfaces between those become more and more significant. Stress due to surface energy incompatibilities, diffusion, and adsorption of gas species at the interfaces between layers participate to the creation of defects. Additionally, the thickness of the passivation layers (typically 0.5 to 5 nm) used to control the profile of the patterns also becomes significant at the concerned dimensions (around 10 nm), and thus their interaction with the later as well. Finally, materials in the stack are being modified by the plasma-material interactions, even when not directly exposed (due to diffusion of species, penetration depths of VUV photons, etc.). Therefore, interfaces are changing during the etch processes because the materials themselves are modified.

More specifically, you will:

  • Investigate the modification of relevant materials and interfaces by gas and plasmas using contact-angle measurement, FTIR, XPS, Raman, AFM, ellipsometry.
  • Identify the most relevant factors to control interfaces and material modification.
  • Adapt the patterning stack and composition of interfacial layers to achieve best performance.
  • Priority will be given to materials relevant for next-generation EUV patterning.

Type of work: 10% literature related to lithography, materials, plasma etch and metrology, 10% to reporting and writing publications or patents, 80% of experimental work and data analysis.

What we do for you

We offer you the opportunity to join one of the world’s premier research centers in nanotechnology at its headquarters in Leuven, Belgium. With your talent, passion and expertise, you’ll become part of a team that makes the impossible possible. Together, we shape the technology that will determine the society of tomorrow.

We are committed to being an inclusive employer and proud of our open, multicultural, and informal working environment with ample possibilities to take initiative and show responsibility. We commit to supporting and guiding you in this process; not only with words but also with tangible actions. Through imec.academy, 'our corporate university', we actively invest in your development to further your technical and personal growth. 

We are aware that your valuable contribution makes imec a top player in its field. Your energy and commitment are therefore appreciated by means of a competitive salary with many fringe benefits. 

Who you are

  • PhD in chemical engineering, material science or equivalent.
  • Basic knowledge of plasma processing (etching or deposition)
  • Experience in metrology for material science and surface energy measurements.
  • Autonomous in your work, with an attention for good reporting.
  • Good English skills (written / spoken).

This postdoctoral position is funded by imec through KU Leuven. Because of the specific financing statute which targets international mobility for postdocs, only candidates who did not stay or work/study in Belgium for more than 24 months in the past 3 years can be considered for the position (short stays such as holiday, participation in conferences, etc. are not taken into account).