'NanoCMOS (PullNano)' / 'more Moore' event: "Beyond 45nm technologies"

Venue

Abstract

Whereas the foremost objective of these Integrated Projects is to carry out advanced research that is breaking new ground, there is also ample attention dedicated to the development of adequate training and education modules and events in Microelectronics and Micro-technologies. These are indeed of utmost importance in order to timely educate the researchers and workforce needed tomorrow. Moreover, also the sharing of scientific and technical information with the wider community is one of the tasks of Integrated Projects. Therefore this event can be attended by the partners within the two projects but also to all those interested in the latest developments in this fascinating exploration of the CMOS technologies of tomorrow.

This event on “Beyond 45nm technologies” is set up in order to fulfil these purposes. It is conceived as a mixture of basic training (Tutorials), of dissemination of the latest results from both projects (with Advanced Presentations on CMOS modules and devices and on EUV lithography issues) and of putting the objectives and activities within both projects in a broader, world-wide perspective. A successful development of the future advanced CMOS nodes will rely on new breakthroughs in both lithography and process and device technologies. This joint organization therefore offers a unique opportunity to the researchers in both projects to get direct and adapted information about the challenges, progress and solutions in the endeavours of the colleagues in the other project. Moreover it offers also to researchers and managers in universities, research centers and companies that are not directly involved in one of these projects, a well balanced overview of the challenges and used approaches in both domains and the opportunity to meet the experts.

Basically it is built up into 4 modules: a session with 6 Tutorials on topics related to advanced CMOS and EUV-Lithography, a session with information on the objectives and status of the 2 Integrated Projects (more Moore and PullNano being the follow-up project for the current NanoCMOS), a session with 3 Invited Papers by recognized experts in these fields and finally a session with 8 advanced presentations on the major results from both projects.

Programme

May 09, 2006

Part I: Tutorials

Part II: Project presentations

May 10, 2006

Part III: Invited speakers - benchmarking

Part IV: Advanced presentations - status of technology

Information & registration

For more information and registration, please visit: http://www.imec.be/tcmwebapp/internet/course.tcm?L=EN_GB&K=MTC&Course=AAAADGN.

Members of the 'Microsystems & Nanotechnology Network' enjoy a reduction of 25%.